After more than a decade of research and development, Tokyo Electron Miyagi Ltd. has introduced an innovative semiconductor ...

Released every 12 to 18 months, 3D NAND scaling outpaces most other semiconductor devices in replacement rate and performance ...

A new cryogenic plasma etching technique developed by Japanese researchers dramatically accelerates semiconductor fabrication ...

DALLAS--(BUSINESS WIRE)--July 11, 2006--Hitachi High-Technologies America, Ltd. today announced that it is working with multiple leading integrated device manufacturers (IDMs) to develop new high-k ...

At the VLSI Symposium being held this week in Honolulu, Hawaii, Leuven, Belgium-based nanotechnology research center IMEC reported that it has improved performance for its planar CMOS semiconductor ...

As transistor sizes shrink, short channel effects make it more difficult for transistor gates to turn a transistor ON and OFF [1]. One method to overcome this problem is to move away from planar ...

SAN FRANCISCO — Applied Materials Inc. here at Semicon West announced a silicon-etch tool featuring integrated metrology for critical-dimension measurements in sub-100-nm process technologies. Applied ...

FREMONT, Calif., Aug. 05, 2021 (GLOBE NEWSWIRE) -- ACM Research, Inc. (“ACM”) (NASDAQ: ACMR), a leading supplier of wafer processing solutions for semiconductor and advanced wafer-level packaging ...

In circuitry, etching is used to remove the deformed layer created during the grinding and polishing of metal components by selective chemical attack. Now, a research group at Nagoya University in ...

IMEC, the Belgium-based nanotechnology research center, announced at this week's VLSI Symposium that it has improved the performance of its planar CMOS using hafnium-based, high-k dielectrics and ...

New GaN power electronics are being developed for power conversion and delivery. In electric transportation such as Electric and Hybrid Electric Vehicles (EV and HEV), these devices are becoming ...